Constructed of 100% perfluoroalkoxy (PFA) for an extraordinary degree of chemical tolerance in critical micro-electronics applications. A ring nut closure provides a secure seal and ease of servicing. Accepts 10" nominal length 222/FLAT configured cartridges. Provides the optimal performance and compatibility available for chemical and temperature tolerance.
Features
- Maximum tolerance to the harshest acids, bases, and organic compounds.
- Non-restrictive fluid flow.
- Usable with temperatures up to 212°F (100°C)
- Multiple levels of cleanliness available to provideextraordinarily low extractable substances
Applications
- Critical process fluids in micro-electronics and semiconductor manufacturing
- Laboratory water and ultra-high purity water requiring the lowest attainable extractable substances
Product Quality
- Manufactured within an ISO 9001:2015 certified quality management system
- Inspected, qualified, and packaged in a clean room environment. Certification of Quality document provided upon request
Dimensions
Materials of Construction
| Head, Sump, Ring Nut: | Perfluoroalkoxy (PFA) |
| Seal: | PTFE encapsulated FKM |
Operating Conditions
| Operating Temp., Max: | 45 psi (3 bar) at 100°C (212°F) 110 psi (7.5 bar) at 25°C (77°F) |
Cleanliness Level Options
Cleanliness level identifiers indicate the type and degree of soaking and rinsing performed to achieve the stated degree of extractable substances.
Level R0 . . . Rinsed with 18MΩ UPW to control effluent particle counts.
Level R1 . . . Acid cleaned and rinsed with 18MΩ UPW to control effluent particle counts, TOC <5ppb, and metal ionic substances to below 40ppb.
Level R2 . . . Acid cleaned and rinsed with 18MΩ UPW to control effluent particle counts, TOC <5ppb, and metal ionic substances to below 25ppb.
Ordering Information
